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以下是对 APPL PHYS EXPRESS 杂志介绍 收藏
缩写名/全名
APPL PHYS EXPRESS
Applied Physics Express
ISSN号 1882-0778
研究方向 物理-物理:应用
影响因子 2015:2.265, 2016:2.667, 2017:2.555, 2018:2.772, 2019:3.086,
出版国家 JAPAN
出版周期 Monthly
年文章数 561
出版年份 0
是否OA No
审稿周期(仅供参考) 平均1.0个月
录用比例 容易
投稿链接
投稿官网 http://apex.jsap.jp/
h-index 79
CiteScore
CiteScoreSJRSNIPCiteScore排名
2.820.9241.083
学科分区排名
大类:Engineering
小类:General Engineering
Q135 / 275
大类:Physics and Astronomy
小类:General Physics and Astronomy
Q139 / 215

PubMed Central (PMC)链接 http://www.ncbi.nlm.nih.gov/nlmcatalog?term=1882-0778%5BISSN%5D
中科院SCI期刊分区
( 2018年新版本)
大类学科小类学科Top期刊综述期刊
物理 3区3区4区
PHYSICS, APPLIED
物理:应用
3区3区3区
中科院SCI期刊分区
( 2020年新版本)
大类学科小类学科Top期刊综述期刊
物理与天体物理 3区3区2区
PHYSICS, APPLIED
物理:应用
1区1区3区
  • 该杂志上中国学者近期发表的论文
  • 同领域相关期刊
中国学者近期发表的论文
1.Humidity effects on tribochemical removal of GaAs surfaces

Author: linmao
Journal: Applied Physics Express, 2016.
2.Ultrasensitive mass sensing method based on slow light in cavity optomechanics

Author: mpjiang
Journal: Applied Physics Express, 2016.
3.Ultrasensitive mass sensing method based on slow light in cavity optomechanics

Author: hey
Journal: Applied Physics Express, 2016.
4.Photoacoustic tomography with a high lateral resolution and a large field of view using a rectangular focused ultrasound transducer

Author: liuxiaojun
Journal: Applied Physics Express, 2016.
5.Photoacoustic tomography with a high lateral resolution and a large field of view using a rectangular focused ultrasound transducer

Author: taochao
Journal: Applied Physics Express, 2016.
6.Magnetic field-controlled hysteresis loop bias in orthogonal exchange-spring coupling composite magnetic films

Author: xfhan
Journal: Applied Physics Express, 2016.
7.Tunable terahertz half-wave plate based on hybridization effect in coupled graphene nanodisks

Author: zzhwcx
Journal: Applied Physics Express, 2016.
8.High-power femtosecond pulse generation in a passively mode-locked Nd: SrLaAlO4 laser

Author: rentingqi
Journal: Applied Physics Express, 2016.
9.Surface Raman spectroscopy with and without reverse Kretschmann configuration: Effect of evanescent-wave-coupled emission

Author: zhimei-qi
Journal: Applied Physics Express, 2016.
10.In situ annealing and high-rate silicon epitaxy on porous silicon by mesoplasma process

Author: jichun.ye
Journal: Applied Physics Express, 2016.
同类著名期刊名称 h-index CiteScore
APPLIED PHYSICS LETTERS4013.58
JOURNAL OF PHYSICS D-APPLIED PHYSICS1722.75
JOURNAL OF APPLIED PHYSICS2942.33
METROLOGIA672.62
REVIEW OF SCIENTIFIC INSTRUMENTS1451.74
JAPANESE JOURNAL OF APPLIED PHYSICS1161.50
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS791.46
HIGH TEMPERATURE251.36
MAPAN-Journal of Metrology Society of India131.20
LOW TEMPERATURE PHYSICS350.77
中科院JCR同大类学科的热搜期刊 浏览次数
APPLIED PHYSICS LETTERS564294
OPTICS EXPRESS383147
JOURNAL OF APPLIED PHYSICS333186
PHYSICAL REVIEW LETTERS283394
OPTICS LETTERS250700
OPTICS COMMUNICATIONS226084
OPTIK218835
CRYSTENGCOMM212634
JOURNAL OF PHYSICS D-APPLIED PHYSICS211005
Chinese Physics B202716